SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask
Sanchez, Martha I., Ukraintsev, Vladimir A., Na, Jihoon, Lee, Donggun, Do, Changhwan, Sim, Hong-seok, Lee, Jung-Hwan, Kim, Jungyoup, Seo, Hwan-Seok, Kim, Heebom, Jeon, Chan UkVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2257390
File:
PDF, 1.11 MB
english, 2017