Ion beam etching of multilevel masking layers written by...

Journal of Micromechanics and Microengineering 2017 / 07 Vol. 27; Iss. 7

Ion beam etching of multilevel masking layers written by two-photon lithography

Schmitt, Jana, Hengsbach, Stefan, Bade, Klaus, Wallrabe, Ulrike, Völklein, Friedemann
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Volume:
27
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/1361-6439/aa6e8f
Date:
July, 2017
File:
PDF, 1.82 MB
english, 2017
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