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Sodium hypochlorite as an oxidizing agent in silica based ruthenium chemical mechanical planarization slurry
Yadav, Kavita, Bisen, Jitendra, Victoria, S. Noyel, Manivannan, R.Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.06.006
Date:
June, 2017
File:
PDF, 697 KB
english, 2017