Atomic scale simulation of silicon anisotropic chemical etching
H. Camon, M. Djafari-Rouhani, D. Estève, A. M. Gué, Z. MoktadirVolume:
1
Language:
english
Pages:
5
DOI:
10.1007/bf01371489
Date:
September, 1995
File:
PDF, 514 KB
english, 1995