[IEEE 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) - Toyama, Japan (2017.2.28-2017.3.2)] 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) - Process development for CMOS fabrication using minimal fab
Khumpuang, Sommawan, Koga, Kazuhiro, Liu, Yongxun, Kara, ShiroYear:
2017
Language:
english
DOI:
10.1109/EDTM.2017.7947527
File:
PDF, 450 KB
english, 2017