Inductively coupled reactive ion etching studies on...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2015 / 03 Vol. 33; Iss. 2

Inductively coupled reactive ion etching studies on sputtered yttria stabilized zirconia thin films in SF 6 , Cl 2 , and BCl 3 chemistries

Subramaniam, Kiruba Mangalam, Rajeswara Rao, Langoju Lakshmi, Jampana, Nagaraju
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4907707
Date:
March, 2015
File:
PDF, 2.51 MB
english, 2015
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