SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography
Henderson, Clifford L., Kim, Sang Kyun, Cho, Hyeon Mo, Koh, Sang Ran, Kim, Mi-young, Yoon, Hui Chan, Chung, Yong-jin, Kim, Jong Seob, Chang, TuwonVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.773117
File:
PDF, 352 KB
english, 2008