Shot noise limit of chemically amplified resists with...

Japanese Journal of Applied Physics 2017 / 06 Vol. 56; Iss. 6

Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.066501
Date:
June, 2017
File:
PDF, 851 KB
english, 2017
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