Resolving critical dimension drift over time in plasma...

Japanese Journal of Applied Physics 2017 / 06 Vol. 56; Iss. 6

Resolving critical dimension drift over time in plasma etching through virtual metrology based wafer-to-wafer control

Lee, Ho Ki, Baek, Kye Hyun, Shin, Kyoungsub
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Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.066502
Date:
June, 2017
File:
PDF, 1.93 MB
english, 2017
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