Evaluation of C...

Japanese Journal of Applied Physics 1996 / 6 Vol. 35; Iss. Part 1, No

Evaluation of C F 2 Radical as a Precursor for Fluorocarbon Film Formation in Highly Selective S i O 2 Etching Process Using Radical Injection Technique

Takahashi, Kunimasa, Hori, Masaru, Inayoshi, Muneto, Goto, Toshio
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Volume:
35
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.3635
Date:
June, 1996
File:
PDF, 1.23 MB
english, 1996
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