Single-step inductively coupled plasma etching of sputtered...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 07 Vol. 35; Iss. 4

Single-step inductively coupled plasma etching of sputtered Nb 2 O 5 /SiO 2 multilayer stacks using chromium etch mask

Taimoor, Muhammad, Alatawi, Abdullah, Reuter, Sabrina, Hillmer, Hartmut, Kusserow, Thomas
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4983683
Date:
July, 2017
File:
PDF, 972 KB
english, 2017
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