Role of Trimethylaluminum (TMA) in Low Temperature Atomic Layer Deposition of Silicon Nitride
Dangerfield, Aaron, Nanayakkara, Charith E., Mallikarjunan, Anupama, Lei, Xinjian, Pearlstein, Ronald M, Derecskei-Kovacs, Agnes, Cure, Jeremy, Esteve, Alain, Chabal, Yves J.Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.7b01816
Date:
June, 2017
File:
PDF, 1.28 MB
english, 2017