[IEEE 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2017.4.24-2017.4.27)] 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Investigation and comparison of design space for ultra-thin-body GeOI/SOI negative capacitance FETs
Lee, Ho-Pei, Yu, Chien-Lin, You, Wei-Xiang, Su, PinYear:
2017
Language:
english
DOI:
10.1109/VLSI-TSA.2017.7942460
File:
PDF, 1.10 MB
english, 2017