High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source
Peck, Jason A., Zonooz, Piyum, Curreli, Davide, Panici, Gianluca A., Jurczyk, Brian E., Ruzic, David N.Volume:
325
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2017.05.074
Date:
September, 2017
File:
PDF, 1.09 MB
english, 2017