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Gas–surface reactions in the growth of dielectric films by chemical vapor deposition: The role of nonequilibrium surface diffusion of adsorbed precursors
S. Ya. UmanskiiVolume:
10
Language:
english
Journal:
Russian Journal of Physical Chemistry B
DOI:
10.1134/S1990793116050250
Date:
September, 2016
File:
PDF, 439 KB
english, 2016