Thermal atomic layer deposition of In 2 O 3 thin films...

Applied Surface Science 2017 / 10 Vol. 419

Thermal atomic layer deposition of In 2 O 3 thin films using dimethyl( N -ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H 2 O

Agbenyeke, Raphael Edem, Jung, Eun Ae, Park, Bo Keun, Chung, Taek-Mo, Kim, Chang Gyoun, Han, Jeong Hwan
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Volume:
419
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2017.05.066
Date:
October, 2017
File:
PDF, 1.13 MB
english, 2017
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