Study of the distribution profile of iron ions implanted...

Study of the distribution profile of iron ions implanted into silicon

A. V. Kozhemyako,Yu. V. Balakshin,A. A. Shemukhin,V. S. Chernysh
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Volume:
51
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782617060185
Date:
June, 2017
File:
PDF, 305 KB
english, 2017
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