Ion beam etching process for high-density spintronic...

Ion beam etching process for high-density spintronic devices and its damage recovery by the oxygen showering post-treatment process

Jeong, Junho, Endoh, Tetsuo
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Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.04CE09
Date:
April, 2017
File:
PDF, 1.77 MB
english, 2017
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