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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN
Sanchez, Martha I., Ukraintsev, Vladimir A., Rajendran, Rajeev, Mochi, Iacopo, Helfenstein, Patrick, Mohacsi, Istvan, Redford, Sophie, Mozzanica, Aldo, Schmitt, Bernd, Yoshitake, Shushuke, Ekinci, YasVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2258379
File:
PDF, 1.85 MB
english, 2017