[IEEE 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2017.4.24-2017.4.27)] 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Impacts of work function variation and line edge roughness on hybrid TFET-MOSFET monolithic 3D SRAMs
Wang, Jian-Hao, Su, Pin, Chuang, Ching-TeYear:
2017
Language:
english
DOI:
10.1109/VLSI-TSA.2017.7942455
File:
PDF, 1.43 MB
english, 2017