Optimization of hollow cathode discharge electrode for...

Optimization of hollow cathode discharge electrode for damage free remote plasma removal process for semiconductor manufacturing

Cho, Tae S., Han, Qing, Yang, Dongqing, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar
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Volume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.056201
Date:
May, 2016
File:
PDF, 2.03 MB
english, 2016
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