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Optimization of hollow cathode discharge electrode for damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S., Han, Qing, Yang, Dongqing, Park, Soonam, Lubomirsky, Dima, Venkataraman, ShankarVolume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.056201
Date:
May, 2016
File:
PDF, 2.03 MB
english, 2016