[IEEE 2017 International Symposium on VLSI Technology,...

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[IEEE 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2017.4.24-2017.4.27)] 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Density functional theory molecular dynamics simulations and experimental measurements of a-HfO2/a-SiO/SiGe(001) and a-HfO2/a-SiO2/SiGe(001) interfaces

Chagarov, E., Sardashti, K., Kwak, I., Ueda, S., Yakimov, M., Kummel, A. C.
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Year:
2017
Language:
english
DOI:
10.1109/VLSI-TSA.2017.7942480
File:
PDF, 1006 KB
english, 2017
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