[IEEE 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2017.4.24-2017.4.27)] 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Selective etching of silicon in preference to germanium and Si0.5Ge0.5
Ahles, Christopher F., Jong Youn Choi,, Wolf, Steven, Kummel, Andrew C.Year:
2017
Language:
english
DOI:
10.1109/VLSI-TSA.2017.7942483
File:
PDF, 466 KB
english, 2017