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[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Organic Mask Removal Assessment for 32nm Fully Depleted SOI Technology with TiN-metal Gate on HfO2
Lachal, Laurent, Chiaroni, Julien, Lajoinie, Emile, Louveau, Olivier, Ritton, Frederic, Lavios, Pascal, Finet, Jean-Marc, Biranceau, Pierre, Arnoux, André, Sauvagnargues, Eric, Bailloux, Olivier, MedVolume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2981617
File:
PDF, 317 KB
english, 2008