[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October...

  • Main
  • [ECS 214th ECS Meeting - Honolulu, HI...

[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Organic Mask Removal Assessment for 32nm Fully Depleted SOI Technology with TiN-metal Gate on HfO2

Lachal, Laurent, Chiaroni, Julien, Lajoinie, Emile, Louveau, Olivier, Ritton, Frederic, Lavios, Pascal, Finet, Jean-Marc, Biranceau, Pierre, Arnoux, André, Sauvagnargues, Eric, Bailloux, Olivier, Med
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2981617
File:
PDF, 317 KB
english, 2008
Conversion to is in progress
Conversion to is failed