![](/img/cover-not-exists.png)
Thermal Diffusion of Silicon Tetrafluoride and Silane
Ando, Yasumasa, Tokuda, TanekiVolume:
83
Language:
english
Journal:
Zeitschrift für Physikalische Chemie
DOI:
10.1524/zpch.1973.83.1-4.153
Date:
January, 1973
File:
PDF, 1.44 MB
english, 1973