Discharge source-dependent variation in the densities of active species in the flowing afterglows of N 2 RF and UHF plasmas
Ricard, André, Sarrette, Jean-Philippe, Jeon, Byungwook, Kim, Yu KwonVolume:
17
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2017.04.006
Date:
July, 2017
File:
PDF, 731 KB
english, 2017