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Effect of thermal annealing sequence on the crystal phase of HfO 2 and charge trap property of Al 2 O 3 /HfO 2 /SiO 2 stacks
Na, Heedo, Jeong, Juyoung, Lee, Jimin, Shin, Hyunsu, Lee, Sunghoon, Sohn, HyunchulVolume:
17
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2017.07.006
Date:
October, 2017
File:
PDF, 1.09 MB
english, 2017