Peculiarities of hole trapping in Al 2 O 3 -SiO 2 gate dielectric stack
Lisiansky, M., Raskin, Y., Roizin, Y., Meyler, B., Yofis, S., Shneider, Y.Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2017.05.035
Date:
May, 2017
File:
PDF, 1.51 MB
english, 2017