Fabrication of block copolymer templates by using dually responsive photoresist bottom layers
Jung, Kyoungok, Bak, Chang Hong, Ku, Se Jin, Kim, Jin-BaekVolume:
118
Language:
english
Journal:
Reactive and Functional Polymers
DOI:
10.1016/j.reactfunctpolym.2017.07.001
Date:
September, 2017
File:
PDF, 1.03 MB
english, 2017