Ti-Si-N films prepared by plasma-enhanced chemical vapor...

Plasma Chemistry and Plasma Processing 1992 / 09 Vol. 12; Iss. 3

Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition

Li Shizhi, Shi Yulong, Peng Hongrui
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Volume:
12
Language:
english
Pages:
11
DOI:
10.1007/bf01447027
Date:
September, 1992
File:
PDF, 791 KB
english, 1992
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