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A comparative study of CH4and CF4rf discharges using a consistent plasma physics and chemistry simulator
Nikolaos V. Mantzaris, Evangelos Gogolides, Andreas G. BoudouvisVolume:
16
Language:
english
Pages:
27
DOI:
10.1007/bf01447148
Date:
September, 1996
File:
PDF, 1016 KB
english, 1996