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Hybrid electron cyclotron resonance-radio-frequency plasma etching of III–V semiconductors in Cl2-based discharges. Part II: InP and related compounds
S. J. Pearton, W. S. Hobson, U. K. Chakrabarti, A. Katz, A. P. PerleyVolume:
11
Language:
english
Pages:
16
DOI:
10.1007/bf01447157
Date:
December, 1991
File:
PDF, 1.66 MB
english, 1991