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Temperature Uniformity Control for Rapid Thermal Chemical Vapor Deposition Reactors
Theodoropoulou, Artemis, Zafiriou, Evanghelos, Adomaitis, Raymond A.Volume:
31
Language:
english
Journal:
IFAC Proceedings Volumes
DOI:
10.1016/s1474-6670(17)44902-0
Date:
June, 1998
File:
PDF, 1.55 MB
english, 1998