![](/img/cover-not-exists.png)
[IEEE 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2017.5.15-2017.5.18)] 2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Characterization of thin carbonized photoresist layer and investigation of dry strip process through real-time monitored variable temperature control
Ryu, Je Hyeok, Kim, Byoung Hoon, Yoon, Sung JinYear:
2017
Language:
english
DOI:
10.1109/ASMC.2017.7969207
File:
PDF, 650 KB
english, 2017