[IEEE 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2016.12.12-2016.12.13)] 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Optimizing the Critical Dimension of the STI etch process by integrating inline scatterometry measurements and Feedback R2R control
Rizquez, Maria, Roussy, Agnes, Pompier, Dennis, Pinaton, Jacques, Pasquet, JulienYear:
2016
Language:
english
DOI:
10.1109/ISSM.2016.7934534
File:
PDF, 6.33 MB
english, 2016