P-10: High-Density Plasma Sputtered InZnSnO Thin-Film...

P-10: High-Density Plasma Sputtered InZnSnO Thin-Film Transistors Fabricated by Back Channel Etching Method on Flexible Polyimide Substrate

Cho, Sung Haeng, Kim, Hee-Ok, Park, Eun-Suk, Kwon, Oh-Sang, Yang, Jong-Heon, Hwang, Chi-Sun, Lee, Jeong-Rak, Do, Jae-Chul, Park, Wan-Woo, Roh, Yong-Suk
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Volume:
48
Language:
english
Journal:
SID Symposium Digest of Technical Papers
DOI:
10.1002/sdtp.11860
Date:
May, 2017
File:
PDF, 527 KB
english, 2017
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