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SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Influence of non-uniform intensity distribution of deformed pellicle for N7 patterning
Kasprowicz, Bryan S., Buck, Peter D., Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Kim, Min-Su, Park, Jin-Goo, Oh, Hye-KeunVolume:
9985
Year:
2016
Language:
english
DOI:
10.1117/12.2242999
File:
PDF, 3.74 MB
english, 2016