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[IEEE 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2016.12.12-2016.12.13)] 2016 International Symposium on Semiconductor Manufacturing (ISSM) - EEPROM retention performance modulation by poly Si grain size & dopant distribution
Hong, Guai Guan, Ke, Zheng, Chyi, Tang Pey, Yongan, Li, Min, Zhou, Hogan, Royston, Venkataramani, Chandrasekar, Koesun, PakYear:
2016
Language:
english
DOI:
10.1109/ISSM.2016.7934527
File:
PDF, 8.72 MB
english, 2016