SPIE Proceedings [SPIE Photomask Japan 2017 - Yokohama, Japan (Wednesday 5 April 2017)] Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology - Electron beam lithographic modeling assisted by artificial intelligence technology
Takehisa, Kiwamu, Nakayamada, Noriaki, Nishimura, Rieko, Miura, Satoru, Nomura, Haruyuki, Kamikubo, TakashiVolume:
10454
Year:
2017
Language:
english
DOI:
10.1117/12.2282841
File:
PDF, 1.25 MB
english, 2017