![](/img/cover-not-exists.png)
Evaluation of tetrakis(diethylamino)hafnium Precursor in the Formation of Hafnium Oxide Films Using Atomic Layer Deposition
Inman, Ronald, Deshpande, Anand, Jursich, GregoryVolume:
765
Year:
2003
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-765-D3.10
File:
PDF, 89 KB
english, 2003