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SPIE Proceedings [SPIE 32nd European Mask and Lithography Conference - Dresden, Germany (Tuesday 21 June 2016)] 32nd European Mask and Lithography Conference - Bayesian analysis for OPC modeling with film stack properties and posterior predictive checking
Behringer, Uwe F.W., Finders, Jo, Burbine, Andrew, Fenger, Germain, Sturtevant, John, Fryer, DavidVolume:
10032
Year:
2016
Language:
english
DOI:
10.1117/12.2249680
File:
PDF, 705 KB
english, 2016