SPIE Proceedings [SPIE Electron Technology Conference ELTE...

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SPIE Proceedings [SPIE Electron Technology Conference ELTE 2016 - Wisla, Poland (Sunday 11 September 2016)] Electron Technology Conference 2016 - Reactive Ion Etching (RIE) of silicon for the technology of nanoelectronic devices and structures

Swatowska, Barbara, Maziarz, Wojciech, Pisarkiewicz, Tadeusz, Kucewicz, Wojciech, Wiśniewski, Piotr, Mroczyński, Robert, Majkusiak, Bogdan
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Volume:
10175
Year:
2016
Language:
english
DOI:
10.1117/12.2261676
File:
PDF, 712 KB
english, 2016
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