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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Advanced hole patterning technology using soft spacer materials (Conference Presentation)
Hohle, Christoph K., Gronheid, Roel, Park, Jong Keun, Hustad, Phillip D., Aqad, Emad, Valeri, David, Wagner, Mike D., Li, MingqiVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2258667
File:
PDF, 111 KB
english, 2017