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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - CD uniformity control for thick resist process
Sanchez, Martha I., Ukraintsev, Vladimir A., Huang, Chi-hao, Liu, Yu-Lin, Wang, Weihung, Yang, Mars, Yang, Elvis, Yang, T. H., Chen, K. C.Volume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2256174
File:
PDF, 937 KB
english, 2017