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Corrigendum: Creation of a two-dimensional electron gas at an oxide interface on silicon
Park, J. W., Bogorin, D. F., Cen, C., Felker, D. A., Zhang, Y., Nelson, C. T., Bark, C. W., Folkman, C. M., Pan, X. Q., Rzchowski, M. S., Levy, J., Eom, C. B.Volume:
4
Language:
english
Journal:
Nature Communications
DOI:
10.1038/ncomms2455
Date:
February, 2013
File:
PDF, 82 KB
english, 2013