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Characterisation of amorphous/nanocrystalline multilayer Si 3 N 4 –Si 3 N 4 /Si 2 N 2 O films prepared by alternately sputtering
Liu, Eryong, Pu, Jibin, Zeng, Zhixiang, Wang, Yongxin, Zhao, WenjieVolume:
33
Language:
english
Journal:
Surface Engineering
DOI:
10.1080/02670844.2017.1292704
Date:
August, 2017
File:
PDF, 2.55 MB
english, 2017