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Simulation of the thermal stress induced by CW 1340 nm laser on 28 nm advanced technologies
Penzes, M., Dudit, S., Monsieur, F., Silvestri, L., Nallet, F., Lewis, D., Perdu, P.Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2017.07.027
Date:
July, 2017
File:
PDF, 1.99 MB
english, 2017