Study on atomic layer etching of Si in inductively coupled...

Plasma Science and Technology 2017 / 08 Vol. 19; Iss. 8

Study on atomic layer etching of Si in inductively coupled Ar/Cl 2 plasmas driven by tailored bias waveforms

MA, Xiaoqin, ZHANG, Saiqian, DAI, Zhongling, WANG, Younian
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
19
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/2058-6272/aa6d4d
Date:
August, 2017
File:
PDF, 2.22 MB
english, 2017
Conversion to is in progress
Conversion to is failed