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A method to fabricate high-aspect-ratio microstructures using PMMA photoresist
Zhang, Tianchong, Yi, Futing, Wang, Bo, Liu, Jing, Wang, Yuting, Zhou, YueLanguage:
english
Journal:
Microsystem Technologies
DOI:
10.1007/s00542-017-3490-x
Date:
July, 2017
File:
PDF, 1.12 MB
english, 2017