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Bubble morphology in U 3 Si 2 implanted by high-energy Xe ions at 300 °C
Miao, Yinbin, Harp, Jason, Mo, Kun, Zhu, Shaofei, Yao, Tiankai, Yacout, Abdellatif M.Language:
english
Journal:
Journal of Nuclear Materials
DOI:
10.1016/j.jnucmat.2017.07.066
Date:
August, 2017
File:
PDF, 15.20 MB
english, 2017